Laboratório Nacional
de Luz Síncrotron

Português

SXS

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ABOUT THIS BEAMLINE


The SXS beamline is an experimental station dedicated to X-ray Absorption and Photoelectron Spectroscopy in the soft X-rays (1 to 5 keV) energy range. It focuses on to study the electronic, magnetic and geometric structures of materials with applications to atomic and molecular physics, analytical chemistry, environmental and geoscience. Other experimental techniques available include X-ray Magnetic Dichroism and Resonant Auger Spectroscopy.

 

The SXS beamline is operational for users since 1997 and a broad scientific community including material science, surface science, atomic physics and chemistry among others has used it. Due an increasing demand from the users, in 2009 this beamline had a new X-ray optics in order to provide photons in the energy range from 1000 eV up to 5000 eV.

 

SXS’ source is a 1.67T bending magnet. There is a nickel-coated and toroidal (1010 x 100 x 100 mm) water cooled mirror that focuses the photon beam at the sample position and it suppresses the harmonic contamination (> 6keV). The incident angle is 0.6 deg and the spot size is 0.6 x 1.2 mm (FWHM) at the sample position.

 

sxs-fluxThe monochromator is a double-crystal with 4 pairs of crystals: Si(111), InSb(111), YB66(400) and Beryl(1010). It works under high vacuum (\(5\times10^{-8}\) mbar) and the first crystals are maintained below 30 Celsius by a water cooling system.

CONTACT


Beamline Email: N/A

Beamline Telephone Number: +55 19 3512 1138

 

Coordinator: Flávio César Vicentin

Coordinator Email: flavio.vicentin@lnls.br

Coordinator Telephone Number: +55 19 3512 1036

For more information on the Beamline Team, check out the Beamline Team’s page here

LAYOUT


OPTICAL ELEMENTS

Element Type Position[m] Description
SOURCEBending Magnet0.00Bending Magnet D04 exit A (4°), 1.67 T
MirrorToroidal Horizontal and Vertical Focusing Mirror7.00Ni coated, RT = 668m, RS = 73mm, \( \theta\)=10 mrad
MonoDouble Crystal Monochromator11.75Water-cooled InSb(111), Si(111), YB\( _{66}\) (400) and Beryl(10-10)

PARAMETERS

Parameter Value Obs. | Condition
Energy range [keV]1-5Si(111)
Energy resolution [\( \Delta\)E/E]\( 10^{-4}\)Si(111)
Beam size at sample [\( \rm mm^{2}\), FWHM]0.6 x 1.2at 3 keV
Beam divergence at sample [\( \rm mrad^{2}\), FWHM]0.2 x 4at 3 keV
Flux density at sample [ph/s/\( \rm mm^{2}\)]\( 4\times10^{11}\)at 3 keV

INSTRUMENTATION

Instrument Type Model Specifications Manufacturer
Total electron yield detectorElectrometer651420 pA – 2 mA rangeKeithley
Fluorescence DetectorSilicon drift diodeSuperFast SDDArea: 25 \( \rm mm^2\); Energy resolution: 125–155 eV Amptek
Photoelectron analyzerHemisphericalPhoibos 150MCD with 9 channels; 3500 eV kinetic energySpecs
FurnaceHalogen lamps/ high vacuum-Max Temp.: 900°CLNLS in-house development
SputteringArgonIG2 ion source0.5-2kV; 2.5mm beam diameter at 25mmRBD
Residual gas analyzerMass spectrometerRGA2001-200 amu; quadrupoleSRS
Sample charge neutralizer Electron flood gunFG15/400-500 eV; 0-5 mASpecs
Sample Cells Liquid-Ultralene window; 4 x 113 \( \mu \rm L\) LNLS in-house development

CONTROL AND DATA ACQUISITION

 

All beamline controls are done through EPICS (Experimental Physics and Industrial Control System), running on a PXI from National Instruments. The data acquisition is done using a Red Hat workstation with the Py4Syn, developed at LNLS by SOL group. CSS (Control System Studio) is used as a graphical interface to display and control the beamline devices.

 

APPLYING FOR BEAMTIME

 

Submission calls are usually announced twice per year, one for each semester. All the academic research proposals must be submitted electronically through the SAU Online portal. Learn more about how to submit a proposal here.

 

 

PHOTOS

SXS: Monocromador / Monochromator



Português:
Cabana Óptica com vista para câmara do monocromador.

English:
Optical hutch showing the monochromator chamber.

SXS: Espelho / Mirror



Português:
Cabana Óptica com vista para a câmara do espelho.

English:
Optical hutch showing the mirror chamber.

SXS: XPS



Português:
Estação de Espectroscopia por Fotoelétrons (XPS) acoplada à Linha de Luz SXS.

English:
X-ray Photoelectron Spectroscopy (XPS) workstation coupled to the SXS beamline.

SXS: Visão Geral / Overview



Português:
Visão geral da Linha de Luz SXS, com vista para a eletrônica de controle, cabana óptica e estação de trabalho.

English:
SXS beamline overview, showing control electronics, optical hutch and workstation.

SXS: Porta-amostras / Sample Holder



Português:
Janela de exibição do porta-amostra da estação de Espectroscopia por Fotoelétrons.

English:
Sample holder viewport at the X-ray Photoelectron Spectroscopy (XPS) workstation.

SXS: XPS



Português:
Estação de trabalho de Espectroscopia por Fotoelétrons (XPS) mostrando a câmara principal, pré-câmara (utilizada para o tratamento e transferência de amostras), manipulador motorizado, bomba de titânio para sublimação, analisador de elétrons, eletrômetros e equipamentos acessórios.

English:
X-ray Photoelectron Spectroscopy (XPS) workstation showing the main chamber, pre-chamber (used for sample treatment and transfer), motorized manipulator, titanium sublimation pump, electron analyzer, electrometers and accessory equipments.

SXS: XPS



Português:
Estação de Espectroscopia por Fotoelétrons (XPS) mostrando a transferência de amostras.

English:
X-ray Photoelectron Spectroscopy (XPS) workstation showing sample transfer.

SXS: Visão Geral / Overview



Português:
Visão geral da Linha de Luz SXS durante experimento com usuários externos.

English:
SXS beamline overview during an experiment with external users.