Laboratório Nacional
de Luz Síncrotron

English

PGM

VOLTAR

SOBRE A LINHA DE LUZ


The PGM (Planar Grating Monochromator) beamline is an experimental station dedicated to X-ray Spectroscopy in the soft X-rays (100 to 1500 eV) energy range, with applications to the study of the electronic, magnetic and structural properties of materials. It is well equipped with in-situ preparation facilities, making it particularly suited for surface science and thin films characterization. In addition to that, it is offers instrumentation for microscopy and photoemission on liquids.

 

PGM’s source is an elliptical polarization undulator with a 50 mm period (EPU50), which allows the photon polarization to be switched among linear horizontal, linear vertical or circular polarization. Its optics is based on a standard planar grating monochromator (PGM) equipped with a 1500 l/mm variable line spacing (VLS) diffraction grating. It serves two branches that operate independently but not simultaneously.

 

The beamline provides several experimental end stations to users. Systems are available for X-ray absorption and its variants (linear and circular dichroism), photoemission (XPS and ARPES), photoemission microscopy (PEEM), XPS on liquids and soft X-ray diffraction.

 

Furthermore, the beam line is equipped with a full featured in-situ preparation system, which allows the user to grow thin films and heterostructures by molecular beam epitaxy (MBE) with thermal evaporators and by pulsed laser deposition (PLD). The samples can then be transferred under ultra-high vacuum conditions and be characterized by the techniques available at the beam line.

CONTATO


Email da Linha de Luz: N/A

Telefone da Linha de Luz: +55 19 3512 1146

Coordenador da Linha de Luz: Julio Criginski Cezar

Email do Coordenador: julio.cezar@lnls.br

Telefone do Coordenador: +55 19 3512 1292

 

Para mais informações sobre a equipe da Linha de Luz, confira a página da equipe aqui

LAYOUT


ELEMENTOS ÓTICOS

Elemento Tipo Posição[m] Descrição
SourceInsertion DeviceInsertion Device U11A, APPLE II Elliptical Polarization Undulator (EPU50), built in-house, 50 mm period, 2.73 m long
M1Toroidal mirror13Au coated; water cooled
M2-GMonochromator15Au coated plane mirror and 1500 l/mm VLS grating
ESExit slit22-
M3a, M3bRefocussing toroidal mirrors29Au coated; used to switch between branches

PARÂMETROS

Parâmetro Valor Obs. | Condição
Energy range [keV]103 – 1500 eVLinear horizontal polarization
Energy range [keV]192 – 1500 eVLinear vertical polarization
Energy range [keV]127 – 1500 eVCircular polarization
Resolving power [E/\( \Delta\)E]1000 - 25000-
Beam size at sample [mm\( ^{2}\), FWHM]0.1 x 0.5 Vertical x horizontal
Flux at sample [ph/s]\( 10^{11}\) – \( 10^{13}\)-

INSTRUMENTAÇÃO

Instrumento Tipo Modelo Especificações Fabricante
Superconducting Magnet--\( \pm 9 \rm T\) along the beam direction \( \pm 4 \rm T\) perpendicular to the beam direction Fast field switching (less than 3 min) Sample temperature between 5 and 420 KOxford Instruments
Electron AnalyzerPhoibos 150 SPECS150 mm radius hemispherical analyzer; CCD detector Energy resolution \( \approx\)2.5 meV; Angular resolution \( \approx\)0.1 degree; Sample manipulator with six degrees of freedom; Sample temperature between 15 and 420 K.SPECS
Photoelectron MicroscopyP 90 SPECSFields of view from 100 down to \( 0.7 \mu \rm m\); Sample temperature from 90 up to 1400 K during measurements; Some possibilities for in-situ preparation (Ar sputtering and e-beam evaporation).SPECS
Electron Analyzer for liquids sample---Scienta
Diffractometer--4 degree of freedom diffractometerLNLS in-house development

CONTROLE E AQUISIÇÃO DE DADOS

 

Todos os controles da linha de luz são feitos através do EPICS (Experimental Physics and Industrial Control System), rodando em um PXI da National Instruments. A aquisição de dados é feita usando uma estação de trabalho Red Hat com o Py4Syn, desenvolvido no LNLS pelo grupo SOL. CSS (Control System Studio) é usado como uma interface gráfica para exibir e controlar os dispositivos da linha de luz. Os sistemas da SPECS Gmbh rodam através do software da fabricante.

 

REQUISIÇÃO DE TEMPO DE FEIXE

 

Chamados de submissão de propostas são abertos usualmente duas vezes ao ano, um para cada semestre. Todas as propostas de pesquisa acadêmica precisam ser submetidas eletronicamente através do portal SAU Online. Saiba mais sobre o processo de submissão de propostas aqui.

 

 

FOTOS

PGM: Visão Geral / Overview



Português:
Visão geral das estações experimentais da Linha de Luz PGM.

English:
Overview of the experimental stations of the PGM beamline.

PGM: Túnel de Transferência / Transference Tunnel



Português:
Túnel de transferência sob ultra alto vácuo.

English:
Transference Tunnel under ultra-high vacuum.

PGM: PEEM



Português:
Microscópio de Fotoemissão (PEEM).

English:
Photo-electron Emission Microscope (PEEM).

PGM: Visão Geral / Overview



Português:
Visão geral das estações experimentais da Linha de Luz PGM.

English:
Overview of the experimental stations of the PGM beamline.

PGM: ARPES



Português:
Estação de fotoemissão com resolução angular (ARPES).

English:
Angle-resolved photoemission spectroscopy (ARPES) station.

PGM: PLD



Português:
Sistema de deposição de filmes por laser pulsado (PLD, Pulsed Laser Deposition).

English:
Pulsed Laser Deposition (PLD) system.

PGM: PLD



Português:
Sistema de deposição de filmes por laser pulsado (PLD, Pulsed Laser Deposition)

English:


Pulsed Laser Deposition (PLD) system.